Nanoscale Structuring - Lithographic Patterning and Structure Preparation

Single module
Duration: 8 weeks
Assessment: Summative

Contact information

Dr Del Atkinson: del.atkinson@durham.ac.uk

Content

The structuring of materials with some or all dimensions down at the nanoscale is now a common feature of many systems studied in physics, chemistry, engineering and biological research work and is present in much modern technology.  There are two broad approaches to producing nanoscale structures; namely the top down approach, where structures are patterned from larger scale structures using lithographic processes, and bottom-up methods that include chemical synthesis and self-assembly. This course will introduce both of these areas and focus on the more generically applicable top-down methods.  Two practical sessions give hands-on introductions to ion-beam and electron beam lithography.